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Metal etching is a technique that removes materials using chemical reactions or physical impacts. Metal etching technology can be divided into wet etching and dry etching.

The etching technique uses a chemical reaction between a specific solution and the thin film to remove the part of the film that is not covered by photoresist and achieves the purpose of etching. This etching method is also called wet etching. Because wet etching uses a chemical reaction to remove the film, and the chemical reaction itself is not directional, the wet etching process is isotropic. In general, this method is not sufficient to define the line width below 3 microns. However, defining wet etching for line widths above 3 microns is still an optional technique.