Wet Processing Equipment for All Chemical Etching Purposes
The etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.
The etching machine is divided into an acid etching machine, an alkaline etching machine, and a hydrofluoric acid glass etching machine (the three kinds of etching machines can be provided by our company).
The acid etching machine is mostly used for etching the inner layer of the circuit board, and the production of small batches of various types of sample boards. Acid copper chloride is generally used (copper chloride is added with hydrochloric acid), which is characterized by easy control, small side corrosion, a large amount of dissolved copper, easy regeneration and recovery, and the etching solution can achieve high-quality etching under stable conditions.
The alkaline etching machine is used for the outer layer of circuit boards, large-scale double-sided board production, and the production of aluminum substrates. Its alkaline etching process has the advantages of cost-saving and easy control.
PCB Etching machine
In photofabrication, developing is the post-exposure process.
Dissolve and remove the photoresist other than those required and form a pattern image of the photoresist.
There is a “soaking method” of immersion in the developer and a “spray method” of spraying, and there is a common use of spray methods in terms of supply efficiency of the developer.
Immediately after the development, a set of heating treatments called post-baking are carried out.
The post-baking box hardens the photoresist, which results in resistance to etching fluid in the next process and improves adherence to substrates.
Etching is a post-developing process.
While continuously transporting using etchants suitable for metal materials (products), a large amount of etching is performed uniformly by the spray method.
As the management of the etchant is important, an etchant autoanalyzer is installed as a supplementary facility, and various chemicals are automatically supplied based on the feedback of each component analysis to maintain a constant etching rate.
Stripping is the post-etching process.
After etching, dissolve the unnecessary photoresist film.
Depending on the type of photo registry, sodium hydroxide heated around 40 to 80℃ or 100℃ is commonly used.
In the case of special resist, mixed solvents such as xylene, alcohols, and ketones may be used.
If the product cannot be stripped by immersion, physical force such as a brush or spray is applied to the product. Immediately after stripping, De-ionized water cleaning, drying, and rust prevention are performed as a set.
By installing 3 processes on one device…
By installing 3 processes on one device…
The Dragon Etching SES lines
from:
https://wetetched.com/wet-chemical-etching-processing-equipment/
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