Main features:
Defect inspection method uses a die-to-database comparison. The system detects mask defects of all types according to SEMI standard: pinholes, pindots, protrusions, mouse bites, breaks, shorts, missing and unwanted features, coordinate and size shifts, corner rounding. Mask coatings: chrome, chrome + oxide, molybdenum, iron oxide.
The system is designed for automatic detection of pattern defects on master masks, reticles and work masks used in production of ICs, semiconductor devices and hybrid ICs.
Automatic Mask Inspection System is designed for automatic detection of mask pattern defects by die-to-database comparison