The patterning is based on a raster scanning technique.
The exposure system uses a continuous ultraviolet argon (crypton) ion laser at wavelength of 350.7nm.
Laser output power 300mW. Model SP-2060 (SP-2060/65) by Spectra-Physics.
The generator is designed to generate patterns on metallized photomasks in the production of LSIs, VLSIs and other electronics devices.
Scanning Laser Pattern Generator is designed for fabrication of masks in production of LSI, VLSI; minimum feature size 600 nm