Laser Pattern Generator

The pattern generator is an automatic system which forms circuit pattern by positioning rectangular images on photo resist plates according to information received from CAD system via a network channel or via a magnetic carrier. The generator works in two modes: positioner, i.e. stop-by-stop exposures, and "on fly" exposure. The machine unit uses vibration damping and thermostable materials (habra diabase, glass ceramic). The machine unit consists of XY-stage, aperture mechanism, focusing system, projection lens and laser beam system. The XY - stage carriage with reticle plate is driven by linear step motors and controlled by laser interferometers. The beam forming system uses a monoblock pulse laser with wavelength 337 nm, 8-ns light pulse and 1-kHz working frequency. The control system is based on a host Intel Pentium II PC and two high-speed single-board industrial computers with VMEbus.

The laser pattern generator is designed for fabrication of metallized reticles (masks) in production of ICs, semiconductor devices of various applications, photoelectronic transducers, LCDs, precision PCBs, MEMS, microware circuits, special measuring and test masks for both production and applications.

Laser Pattern Generator is designed for fabrication of masks in production of semiconductor devices, LCDs, PCBs, etc