Laser Pattern Generator

Throughput at 0.5 s exposure time and 10 x 10 mm multiplication step on 127 x 127 mm plates ( 61 dice )	> 30 photomasks/hr

XY-stage working travel	150 mm x 150 mm

XY-stage positioning error	< ?0.4 ?m

XY-stage positioning repeatability	> 0.2 ?m

Reduction ratio	10:1

Max. die size on photomask	10 mm x 10 mm

Photographic resolution limit ( min. feature - line / space ) of the projection system on 10 x 10 mm die field	1 ?m

Nonreproducibility of 1.2 ?m feature (line/space )	< 0.2 ?m

Photomask blank plate size:

	4 x 4 (102 mm x 102 mm)

	5 x 5 (127 mm x 127 mm)

	6 x 6 (153 mm x 153 mm)

Reticle size :

	5 x 5 (127 mm x 127 mm)

	6 x 6 (153 mm x 153 mm)

Weight	1800 kg

Operating Conditions

The photorepeater is designed for operation in clean room. Machine unit - Class 100. Control system - Class 10000.
Power supply of the photorepeater is provided from AC power line 220/380 V, 50 Hz; power consumption up to 3 kW; footprint 17 m² ( 10 m² in clean room Class 100, 7 m² in clean room Class 10 000 ).

The system operates in the following automatic modes:

The system operates in automatic mode and is remotely controlled by the operator. Its operation is based on die-by-die transfer (multiplication) of reduced reticle image onto the photomask blank plate.

The photorepeater is intended for manufacture of metallized master and production photomasks in LSI, VLSI production.

Photorepeater is designed for fabrication of metallized master and production photomasks in production of semiconductor devices

Brand Name:EM-5062M

Country:Belarus
telephone:375-17-2232226


Brand Name:	EM-5062M

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