laser machine model "Tisarius-D"

In applications related to laser cooling system Tisarius-D efficiently cools such atoms as Ca (397, 423, 442.7 nm), Mg (383 nm), Pb (368.3 nm), Rb (421 nm), Sr (422, 481 nm), Yb (369.5 nm), Er (401 nm), Tm (410-420 nm) and many others. In areas connected to physical vapour deposition system Tisarius-D provides precision control in deposition of such materials as aluminium (394 nm), titanium (391 nm), yttrium (408 nm), tungsten (385 nm), gallium (403 nm) and others.

The most important application areas of this system are atom/molecule cooling and trapping, in situ process control of physical vapour deposition, nanostructure fabrication, atomic lithography, gas analysis, new high-precision spectroscopy experiments, trace substance detection, high speed wafer inspection, etc.

This leading-edge tuneable laser system features the highest efficiency of second-harmonic conversion for CW single-frequency radiation and record-setting ultra-narrow radiation line width within UV to blue-green spectrum range. Electronic control systems of the laser and the resonant enhancement frequency doubler provide a unique Auto Re-Lock function allowing Tisarius-D to operate reliably and stably even in conditions of considerable external perturbations.

on the basis of tandem "Tisarius-D" including a (700-1050 nm) and efficient frequency (350-525 nm). When pumped by a standard 5-12-W DPSS/fibre laser, Tisarius-D delivers 100-800 mW of single-frequency output with radiation line width < 10 kHz at selected wavelength within the 350-525 nm range.