unbalanced management sputtering system
Product Details
The magnetron sputtering system that can be install 4 external sources on the chamber side and 2 internal sources on the top. Automatic operation is available by means of auto-gas controller, pneumatic target shutter and PLC. It is used for development of Multi-layer thin film and reactive magnetron sputtering process.
- Country:South Korea
- telephone:82-031-499-0230
| The magnetron sputtering system that can be install 4 external sources on the chamber side and 2 internal sources on the top. |
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