Vacuum Machine-----TSU350 Dual-chamber plasma-enhanced chemical vapor deposition equipment

Vacuum Machine-------TSU350 Dual-chamber plasma-enhanced chemical vapor deposition equipment  is set magnetron sputtering, multi-arc plasma deposition, vapor deposition technology integrates three. Can be used to prepare single-layer or multi-layer metal film, magnetic film, the semiconductor film, film, insulation film, magnetic recording film. optical recording film, a transparent conductive film, high temperature superconductor coating. Also in variants, the particle surface coating on silicon steel. Suitable for teaching and scientific research institutes, research, small and medium enterprises plating processing and production of various films

Vacuum Machine------TSU350 Dual-chamber plasma-enhanced chemical vapor deposition equipment is set magnetron sputtering