PVD ion electro plating machine

We can design the dimension of the equipment according to customers special technique requirement.

Remark

Manual/Automatic/PC/PLC + HMI/PC  four choice of control mode

Control mode

Number display composite vacuum gauge: from atmosphere to 1.0*10^-5Pa

Measure mode

Public rotation Frequency control: 0-20 rotation per minute

Workpiece motion mode

Normal temperature to 350 centi-degree PID control, radiation heating.

Workpiece baking temperature

Diffusion pump +Roots pump +Mechanical pump(5.0*10^-4Pa)

Molecule pump +Roots pump +Mechanical pump(5.0*10^-5Pa)

Vacuum system

Vertical single(side) door, pump system postposition, double water-cooling

Vacuum chamber structure

Quality flowmeter + electromagnetism ceramic valve

Process gas control

Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.

Power source

Twelve multi-arc targets + two sets of  plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets

Eight multi-arc targets + a pair of twin (MF)magnetron sputtering targets

Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets

Coating mode and main confirguration

1250*1100mm

1000*1000mm

800*1000mm

JTZ-1250

JTZ-1000

JTZ-800

Dimension

Mode

2.The performance of electric arc plasma evaporation source is reliable, be able to work under the current 30A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition.

   Characteristic: 1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.

PVD ion electro plating machine integrated three technology of DC magnetron sputtering, middle frequency sputtering and electric arc ion evaporation, combining the linear ionize source and pulse bias coating to thin the deposition particles. The various film performance are improved, and be able to coat alloy film, compound film, multilayer composite film on the surface of metal as well as nonmetal. After years of dedicated R&D by our engineer, through unique cathode electric arc ion and unbalanced magnetron systems, we develop a package of PROPOWER series of computer automatic control system. It makes the coating film adhesion density as well as good complex consistency, and solve the problems of the complexity of the manual operation, film color inconsistencies, etc.

PVD ion electro plating machine is reliable, be able to work under the current 30A .