JCP200 Multi-target magnetron sputtering machine series is magnetron sputtering film coating can be used to prepare single-layer or multi-layer metal film, the semiconductor film, film, insulation film magnetic recording layer optical recording film, a transparent conductive film, high temperature superconductor coating. Also in variants, powder coating surface. Applied research institutes in the teaching, research, small and medium enterprises of various plating film processing.
JCP200 Multi-target magnetron sputtering machine is magnetron sputtering film coating can be used to prepare single-layer
Physical vapor deposition (PVD) is a technology where a material is evaporated and condensed to form a thin film coating over an object (substrate). With a wide range of coating materials and thicknesses, PVD can be customized to applications and the coatings can be optimized ...