Target size: max. length 2000mm and max. width 1400mm
(over 100 pieces)with Cpk 8.10768
Physical properties: lsotropic properties,equiaxed microstructure and uniformilty on density
Density: 7.19gm/cm3 based on 99.9% purity
Specification : various of titanium target as customers requirement
Material: Gr1,Gr2,Gr3,Gr5,Gr7,Gr12
Standard: ASTM ,AMS
Purity : ranging from 99.5%(2N5)99.995%(4N5)powder : 50,100&325 mesh
Titanium sputtering targets
Sputtering targets
Sputtering targets
Titanium sputtering targets
used in vacuum coating
ASTM B348,ASTM B381,AMS 4928
Gr1,Gr2,Gr3,Gr5,Gr7,Gr9,
Delivery Time: | 10days |
Package: | standard export packageplywood case |
Supply Ability: | 300 Piece/Pieces per Week |
Minimum Order Quantity: | 10 Piece/Pieces |
Payment Terms: | D/P,T/T |
Brand Name: | BJTCT |
Place of Origin: | Shaanxi, China |
Application: | industrial |
Brand Name: | BJTCT |
Place of Origin: | Shaanxi China (Mainland) |
SPUTTERING TARGET BONDING Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded ...
Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded to a metallic or ceramic ...
Metal sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These targets are high-purity metals or alloys with specific chemical compositions, and they are subjected to ...