Pressing Method: Smelting, HIP
Roughness: 3.2um
Relative Density: 98%
Purity: TiAl 99.8% min.
Atom Ration: 50:50, 75:25 or according to customer designs
Used as sputtering target for coating tools
Used as sputtering target
Atom Ration: 50:50, 75:25 or customer designs
Purity: TiAl 99.8% min.
Relative Density: 98%
Delivery Time: | within 30 days from the order date |
Package: | in cartons |
Supply Ability: | 200 Piece/Pieces per Month |
Minimum Order Quantity: | 1 Piece/Pieces |
Payment Terms: | T/T |
Place of Origin: | China |
Brand Name: | King Choice |
Brand Name: | King Choice |
SPUTTERING TARGET BONDING Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded ...
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Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded to a metallic or ceramic ...