Wafer Soluble Strip Tool
Product Details
HP CLEANER, This cleaning system removes all types of particle from a variety of substrates (wafer, photo masks, FPD, optical disks, etc?). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray. (1) PLC FESTO
- Country:South Korea
- telephone:82-82 070 8233 7767
| Semitool WST 306 Wafer Soluble Develop/Strip Tool |
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