ma-1200 exposure system

Optimum soft contact & proximity Manual exposure system for multi-items, small production, experiment and research Passive exposure system - Full scale-uniform lighting by unique mirror and lens optical system - Multi-layer exposure by unique gap device and manual alignment system MA-1200 EXPOSURE Substrate Size Max 200 X 200 X t0.3~2.8mm Alignment Substrate pre-alignment : Pin alignment Manual alignment type Auto alignment type GAP 30 to 150 ? Resolution L&S 10?

exposure system

Country:South Korea
telephone:82-82-41-620-9006

exposure system

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UV exposure system

UV scattered light exposure, High uniformity onto large dimension ...

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UV exposure system

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Come From UNILAM CO,.Ltd.