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Nanoimprinting module:
Technical Specication
Process is controlled by a programmable PLC with touch screen user interface.
User can customize process parameters.
Wafer and Mold are held by vacuum chuck
UV curable imprint polymer compatible with traditional photolithography process.
General Configuration
Wafer size 4 in
Imprintable wafer area 2 in
Imprint pressure 0 - 25 PSI
Mold substrate size 5 x 0.090 in
Typical imprint throughput < 5 minutes/wafer
Process specification
Controller Module
Dimension 5.8 x 16.5 x 12 in 12 x 16 x 1.5 in
Weight 18.5 LB 6.5 LB
Environment 10 - 35 C, 65%
Photolithography aligner compatible with Suss, Canon, and other aligners
Filtered Pressure source 70 - 100 PSI
Vacuum source <-14 PSI
Power 110-220V, 2A, 50/60 Hz
Clean-room class 1000 or better
Facility requirements
Physical properties
Technical Capability
100 nm100 nm
Nanoscale molecular devices / circuits fabricated by
Auto ReleaseTM Nanoimprint Lithography
Nanolithosolution provides a revolutionary one-step,
Auto ReleaseTM nanoimprint lithography solution with
sub-10 nm resolution and accurate overlay alignment.
This technology is built on years of research at HP Labs.
Our technology is so simple to implement, essentially
everyone with a microlithography process can
upgrade to nanoscale lithography with no disruption
to their regular process flow and facility. And our
solution is the most cost-effective in the industry. Our
process has been proven by some of the world leading
institutes in state-of-the-art nanotechnology research
to develop many ground-breaking applications
EQUIPMENT
Nanolithosolutions equipment consists of a nanoimprint module and a controller module. When combined with a
conventional optical mask aligner, our solution provides a semiautomatic nanoimprint with precision alignment capability for
anyone using a traditional photolithography process. Our equipment is compatible with most widely available optical aligners
in microfabrication facilities around the world
Nanoimprint module: AR-NIM-100
The nanoimprint module is a set of equipment that fits into an aligner like a typical wafer holder and mask holder. It precisely
holds the imprint mold and wafer and accurately performs nanoimprinting and separation of the imprint mold with one easy
step.
Nanoimprint controller: AR-IMC-100
The nanoimprint controller provides semiautomatic control of the imprinting process. The program directs the user through a
series of simple and straightforward steps to complete the entire procedure.
Advantages
- Simple and Robust process: proven through the research of world-leading institutions.
- Precision alignment: mask alignment is limited only by optical aligner capability.
- Easy to use: a person familiar with semiconductor processes can be trained in a few hours.
- No disruption with existing process: No extra equipment footprint required.
APPLICATIONS
optical devices, displays, data storage, biotech, semiconductor ICs, chemical synthesis, and advanced materials.
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