thin film materials

Symetrix Corporation was founded in 1986 by Carlos Paz de Araujo, Larry D. McMillan and others as an SBIR research and development company. Since then, Symetrix Corporation has grown to become a major intellectual property company doing advanced materials and process research for the worldwide semiconductor industry. Symetrix has made significant advancements in device modeling, integrated circuit device physics, chemistry, thin film materials, semiconductor processing, non-volatile memory design and many other disciplines.

The main technological achievement of Symetrix Corporation has been to develop complete compatibility between the standard CMOS semiconductor process and the layered perovskite ferroelectric materials now being used to make high-density non-volatile Ferroelectric Random Access Memories (FeRAMs). 

Symetrix Corporation now controls a valuable portfolio of patents in the U.S. and the world and has licensed many of these patents to major semiconductor companies in Japan, Korea, Europe and the U.S. 

Over the years, Symetrix Corporation has worked with major semiconductor companies, universities, government research organizations and others throughout the world. During the course of this work Symetrix Corporation has earned a reputation as a leader in FeRAM intellectual property and has forged many alliances within the industry.