eb nano lithography system

Country: South Korea
telephone: 82-317075980

This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method
(Patent registered)

This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method

This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method

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