eb nano lithography system
Product Details
This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method
(Patent registered)
(Patent registered)
This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method
- Country:South Korea
- telephone:82-317075980
| This system is has 0.0012nm(1.2pm) address size(beam positioning resolution) controlled by Field Size Modulation Method |
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