silicon PARTS

Si-Target : As a physical vapor deposition material, target is used in the sputtering process. Depending on its purpose, it is made from silicon, aluminum and other materials.

Others : The shift to use of silicon in the manufacture process of the semiconductors will be accelerated due to enhanced large-width wafers and refined processes.

Si-Target : As a physical vapor deposition material, target is used in the sputtering process.

  • Country:South Korea
  • telephone:82-31-5477222
Si-Target : As a physical vapor deposition material, target is used in the sputtering process.
*Your name:
*Your Email:
*To:WORLDEX I&T
*Subject:
*Message:
Enter between 20 to 3,000 characters. English only.     Characters Remaining: 0 / 3000
*Enter the secure code shown below Mfrbee security Image      Reload Image

We do inquire for you , please wait ...