Purity Grade customized
Formula C2F6
Application
Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon.Together with trifluoromethane it is used in refrigerants R508A (61%) and R508B (54%).
Molecular Weight 138.01g /mol
Alternative name Carbon hexafluoride,1,1,1,2,2,2-Hexafluoroethane,Perfluoroethane, Ethforane, Halocarbon 116, PFC-116, CFC-116, R-116, Arcton 116, Halon 2600
CAS No. 76-16-4
Package N/A
Post by Damon Huang Chemicals @2012-08-07 14:05:31