ZnO Sputtering Target
Grade:99.99%
Chemical Composition:
1.ZnO Target, Purity (wt%) 99.99% min
2.Impurity Content: Unit PPm
Element Fe Cu Pb Cd Ni Mn K Na Ca Sb Mg Si
Content 8 5 9 6 9 5 5 4 3 6 5 8
Density:
1.Density of target: 5.5g/cm3 min
2.Relative densityof target: 98% min
Target color: Pale yellow
Shape: Square/Round, According to your request
Max Size: 400mm; 400× 250× 15mm or as customer'request.
Customization is available
Application:
Zinc oxide target is a good semiconductor materials, which are widely used in: liquid crystal display, thin film transistor, diodes, thin film solar cells, etc.,
Post by Bai Jason Minerals & Metallurgy @2015-06-07 11:57:41