Al2O3 Sputtering Target

Packaging
bag
Delivery
15 Days

Al2O3 Sputtering Target

Grade:99.99%

Chemical Composition:

1.Al2O3 Target, Purity (wt%) 99.99% min

2.Impurity Content: Unit PPm

Element Fe Cu Pb Cd Ni Mn K Na Ca Sb Mg Si
Content 6 5 7 6 5 5 3 4 8 6 8 10

Density:

1.Density of target: 3.89g/cm3 min

2.Relative densityof target: 98% min

Target color: White


Shape: Square/Round, According to your request

Max Size: 400mm; 400× 250× 15mm or as customer'request.

Customization is available

  • Country: China (Mainland)
  • Business Type:
  • Market:Europe
  • Founded Year:2007
  • Address:office 902,Unit 1, Building 12, Shangcheng Garden,Xinhua Distric, Heibei, China
  • Contact:Bai Jason
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SPUTTERING TARGET BONDING
SPUTTERING TARGET BONDING

SPUTTERING TARGET BONDING Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded ...

Longhua Technology Group (Luoyang) Co., Ltd

SPUTTERING TARGET BONDING
SPUTTERING TARGET BONDING

Sputtering target bonding is a process that involves attaching a sputtering target to a backing plate or a substrate holder. The bonding process is crucial in ensuring smooth and efficient sputtering operations. The target material is typically bonded to a metallic or ceramic ...

Longhua Technology Group (Luoyang) Co., Ltd

METAL SPUTTERING TARGET
METAL SPUTTERING TARGET

Metal sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These targets are high-purity metals or alloys with specific chemical compositions, and they are subjected to ...

Longhua Technology Group (Luoyang) Co., Ltd