ZnO Sputtering Target
Product Quick Detail
- Packaging
- bag
- Delivery
- 15 Days
Specifications
ZnO Sputtering Target
Grade:99.99%
Chemical Composition:
1.ZnO Target, Purity (wt%) 99.99% min
2.Impurity Content: Unit PPm
Element Fe Cu Pb Cd Ni Mn K Na Ca Sb Mg Si
Content 8 5 9 6 9 5 5 4 3 6 5 8
Density:
1.Density of target: 5.5g/cm3 min
2.Relative densityof target: 98% min
Target color: Pale yellow
Shape: Square/Round, According to your request
Max Size: 400mm; 400× 250× 15mm or as customer'request.
Customization is available
Application:
Zinc oxide target is a good semiconductor materials, which are widely used in: liquid crystal display, thin film transistor, diodes, thin film solar cells, etc.,
- Country: China (Mainland)
- Business Type:
- Market:Europe
- Founded Year:2007
- Address:office 902,Unit 1, Building 12, Shangcheng Garden,Xinhua Distric, Heibei, China
- Contact:Bai Jason
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