ZnO Sputtering Target

ZnO Sputtering Target

Grade:99.99%

Chemical Composition:

1.ZnO Target, Purity (wt%) 99.99% min

2.Impurity Content: Unit PPm

Element Fe Cu Pb Cd Ni Mn K Na Ca Sb Mg Si
Content 8 5 9 6 9 5 5 4 3 6 5 8

Density:

1.Density of target: 5.5g/cm3 min

2.Relative densityof target: 98% min

Target color: Pale yellow

Shape: Square/Round, According to your request

Max Size: 400mm; 400× 250× 15mm or as customer'request.

Customization is available

Application:

Zinc oxide target is a good semiconductor materials, which are widely used in: liquid crystal display, thin film transistor, diodes, thin film solar cells, etc.,